Exhibition: nano tech 2020
Zone: Academia Poster Session
Ultra-low-voltage hybrid facing sputtering
We are developing a hybrid facing sputtering system capable of both ultra-low damage and ultra-low voltage sputtering, which is a key technology in the field of manufacturing multi-layered thin-film devices, such as organic EL, film-based electronic displays.
Product 1 Presentation
Hybrid facing-target sputtering equipment capable of both ultra-low damage and ultra-low voltage deposition
The hybrid facing-target sputtering is used for forming ITO transparent conductive film. 1) Sputtering voltage during film formation is -100 V, significantly lower than 200 V, which is impossible with the conventional sputtering method, 2) Resistivity at room temperature of as-depo film fabricated without substrate heating using only Ar gas is 5.2 x 10-4 Wcm, have been achieved at the same time.
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Professor Emeritus at Yamaguchi University
1030-9 HASE, ATSUGI 243-0036, JAPAN, Kanagawa Japan 243-0036